ZEN
Single-Wafer Type Multiprocessor
A single type processor with a variety of chamber configurations to meet various process needs
This equipment supports a high concentration ozone and high temperature sulfuric acid allowing stable stripping of hardened resist.
This achieves processing to meet the applications by selecting from a wide variety of processing methods, including ultrasonic, two-fluid, and high-pressure JET. Available to meet the processing needs of various fields, such as MEMS, semiconductors, LEDs, and solar cells.
Features
| Multi-Process | Capable of recovering and reusing multiple chemicals |
|---|---|
| Module Configuration | Capable of installing up to 8 chambers which are integrated with respective chamber modules |
| Significant Reduction in Running Costs | Reduction of conventional resist stripping processing cost down to 1/16 |
Supported processes
Particle Removal / Resist Stripping / Lift-Off / Polymer Removal