SEMICONDUCTOR MEMS CLEANING EQUIPMENT

From manual to fully automatic, we can manufacture equipment to suit your applications. This supports a wide range of workpiece sizes with high quality and realizes a stable temperature control and highly accurate concentration control. This also supports a wide range of chemicals such as acids, alkalis, and organic solvents. This suits various drying methods such as spin drying, IPA vapor drying, and Marangoni drying.

Features

High Process Performance	Simple processing structure and optimized circulation nozzles to ensure uniform circulation
High Throughput	Available for a control system capable of controlling the conveyance between tanks to minimize the distance and the time
Improved Maintainability	Parts laid out for easy maintenance
Equipment Design	It can be designed for process optimization based on a wealth of experimental data
Extensive Results	Available to offer the best equipment customized to meet your needs based on our results in a wide range of fields, including semiconductors and MEMS

Supported processes

RCA Cleaning / Nitride Film Removal / Oxide Film Removal / Polymer Removal / Resist Stripping / Silicon Etching / Sacrificial Layer Etching / Metal Etching / Developing